Preparation and Characterization of Chromium(III) Oxide Films by a Novel Spray Pyrolysis Method

Abstract

Chromium(III) oxide films of 2000A thickness were deposited on n-type silicon wafers by a novel spray pyrolysis method. Different spray solutions, all containing a chromium acetylacetonate complex, gave different rates of film deposition. IR spectroscopy of these films confirmed them to be alpha-Cr203. The deposited films of alpha-Cr203 were found to be homogeneous and uniform with breakdown potentials in excess of 20 V. The characteristics of films prepared from different spray solutions are compared and discussed.

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Document Details

Document Type
Technical Report
Publication Date
Dec 21, 1990
Accession Number
ADA231271

Entities

People

  • Aaron Wold
  • Kirby Dwight
  • Robert N. Kershaw
  • Y. T. Qian

Organizations

  • Brown University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Acetic Acid
  • Availability
  • Chemistry
  • Chromium
  • Classification
  • Diffraction
  • Films
  • Light Sources
  • Oxide Films
  • Security
  • Spectra
  • Spectroscopy
  • Thickness
  • Thin Films
  • United States Government
  • X Rays
  • X-Ray Diffraction

Fields of Study

  • Materials science

Readers

  • Organic Chemistry
  • Thin Film Deposition Science.