Bipolar Transistors in Silicon-on-Sapphire (SOS): Effects of Nanosecond Thermal Processing
Abstract
Nanosecond thermal processing (NTP) using an XeCl excimer laser was employed in the fabrication of npn bipolar transistors in SOS. Functional devices, with current gain Beta approaching 100, were obtained. The deleterious effects of diffusion pipes in SOS material were minimized using rapid laser activation of ion implanted dopant.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1990
- Accession Number
- ADA232008
Entities
People
- B. W. Offord
- Kurt H. Weiner
- S. D. Russell