Wavelength Independent Optical Lithography and Microscopy
Abstract
During the past contract period we have successfully established the field or near-field optics and subwavelength light beam technology. We have experimentally verified some of the physical parameters upon which the collimation of light in the near-field depends and have demonstrated that collimation better than one tenth the wavelength can be achieved in both transmission imaging and reflection imaging and that lithographic replication at one fifth the wavelength is attainable. In addition, we have also demonstrated that darkline defects in GRIN-SCH-SQW diode lasers can be directly observed at high spatial resolution using methods of lenseless near-field imaging.
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 30, 1990
- Accession Number
- ADA232036
Entities
People
- Michael Isaacson
Organizations
- Cornell University School of Applied and Engineering Physics