Oxidation Studies of Fluorine Containing Diamond Films
Abstract
The thermogravimetric method is used to study the oxidation properties of plasma grown diamond films both with and without fluorine. The oxidation experiments are carried out over a temperature range of 600 C - 800 C and in pure oxygen at one atmospheric pressure. Our experiments show diamond films with fluorine are more resistant (by as much as a factor of 4 at 700 C) to oxidation. The activation energy for oxidation, on the other hand, is at least a factor of 2.3 lower for diamond films with fluorine. These results lead us to postulate that oxidation mechanisms for diamond films are quite different depending on whether there is fluorine or not. For diamond films without fluorine the oxidation seems to proceed as a rate limited reaction, while for films with fluorine the oxidation seems to be a diffusion limited reaction. There is also a weak dependence of oxidation rates on film density, crystal texture, and the phase composition of the diamond film.
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 26, 1991
- Accession Number
- ADA232696
Entities
People
- D. V. Tsu
- K. J. Grannen
- R. J. Meilunas
- R. P. Chang
Organizations
- Northwestern University