A Combined XPS-ISS-Modulated Molecular Beam Investigation of the Reactions of Oxygen and Fluorine with Silicon Surfaces
Abstract
The chemical reaction between Si(100) and molecular and atomic oxygen and fluorine has been studied. Using modulated molecular beam mass spectrometry, XPS and ISS, the kinetics of adsorption reaction and desorption have been studied in detail. Atomic fluorine and oxygen are much more reactive at high coverages than their molecular counterparts. At low coverages, this is true for O, but not for F.
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 15, 1991
- Accession Number
- ADA234867
Entities
People
- Thomas Engel
Organizations
- University of Washington