Activated-Surface Chemical Vapor Deposition

Abstract

The purpose of this study has been to construct and to achieve operation of a high-resolution, ultra high vacuum scanning tunneling microscope (STM) and to use the instrument to reveal the chemistry and physics of surface modification, etching or deposition that can be induced by the STM current. Typical approaches to the operational requirements of the STM are described: (1) The mechanical structure of the STM must allow a large range of 3-dimensional motion, yet be sufficiently rigid and isolated from external vibrations to provide less than 1 angstrom vibration of the tip-sample gap and lateral position. (2) Piezoelectrics used in STMs normally depolarize below 200 C, thus limiting vacuum bakeout temperatures to around 150 C. A turbomolecular pump combined with ion and titanium sublimation pumps is used to reach 10-10 torr (UHV). (3) Tungsten tips of a few hundred angstroms radius are produced by suspending a wire in an etching solution with the weight or size of the wire hanging below the neck minimized and the current rapidly terminated after the wire breaks.

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Document Details

Document Type
Technical Report
Publication Date
Feb 25, 1991
Accession Number
ADA236083

Entities

People

  • Alan Gallagher

Organizations

  • Binghamton University

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Charged Particles
  • Chemical Vapor Deposition
  • Chemistry
  • Classification
  • Construction
  • Electron Microscopes
  • Electron Microscopy
  • Electrons
  • Materials
  • Materials Science
  • Measurement
  • Microscopes
  • Procurement
  • Security
  • Standards
  • United States
  • Vapors

Fields of Study

  • Physics

Readers

  • Electrical Engineering
  • Nanoscale Plasmonic Nanotechnology
  • Thermal Physics or Thermal Science.