Patterned Etching of Infrared Detector Arrays
Abstract
We have attempted to develop a patterned etching technique for infrared detector arrays based on photo-induced processes. The technique is based on the efficacy of methyl radical etching of II-VI compounds such as HgCdTe and CdTe. Methyl radicals were produced in a pattern above a HgCdTe substrate by photodissociation a radical precursor such as acetone or nitromethane using an excimer laser operating at 193 nm. Neither optical nor scanning electron microscopy could confirm the presence of any etching action. The failure of the proposed technique is ascribed to surface scavenging and/or reaction quenching mechanisms.
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 19, 1991
- Accession Number
- ADA236124
Entities
People
- Andrew Freedman
Organizations
- Aerodyne Research