Bimonthly Report Number 9 Detailing Work Done on Contract N00014-89-C- 2238 during April and May 1991 (Micrion Corporation)
Abstract
Progress on the advanced column continued in the areas of imaging, spot size measurements, and solving a high voltage problem. We imaged an X-ray mask with the column to verify image parameters such as dose and dwell time to successfully image a mask without damage. We produced images of both 0.5 um features and associated clear and opaque defects with less than the maximum acceptable dose. The maximum acceptable dose is one that will produce images with minimal channeling and ion-induced sputtering. We automated spot size algorithm measurements using error function analysis and routinely measure spot sizes 5-10 nm greater than predicted. These are measured using a single isotope (69)Ga ion source which improved spot sizes by 5 nm. We have completed the proof of concept (POC)test column, on schedule, and began testing the production prototype column. This latter column did not change significantly from the POC column. All major components stayed the same.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 14, 1991
- Accession Number
- ADA237698