Pressure Effects in the Microwave Plasma Growth of Polycrystalline Diamond

Abstract

Microwave plasma deposition of polycrystalline diamond is being investigated over the pressure range 1 to 100 kPa. the conditions of growth, microstructure, and spectroscopic properties of the resulting materials are being compared. A phenomenological description of the dependence of diamond microstructure upon growth conditions has been developed. Diamond films were grown in two different flow systems both using an Applied Science 1.5kW, 2.45GHz magnetron source and waveguide arrangements. All substrate surfaces were prepared by diamond paste abrasion before deposition. Polycrystalline particles and films were examined by scanning electron microscopy and Raman spectroscopy.

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1991
Accession Number
ADA237751

Entities

People

  • A. B. Harker
  • J. F. Denatale

Tags

Communities of Interest

  • Air Platforms

DTIC Thesaurus Topics

  • Chemical Kinetics
  • Diamond Films
  • Electron Microscopy
  • Energy
  • Films
  • High Pressure
  • Materials
  • Microstructure
  • Microwaves
  • Polycrystals
  • Radiation
  • Raman Spectra
  • Scanning Electron Microscopy
  • Spectroscopy
  • Substrates
  • Surface Energy
  • Surface Temperature

Fields of Study

  • Materials science
  • Physics

Readers

  • Microwave Engineering.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene