Chemical Reactivity and Electronic Structure of Silicon Microclusters

Abstract

The tight-binding model is used to study the structure and chemical reactivity of medium sized clusters, Si10-Si60. First, the validity of the model is established with a comparison to existing experimental and other calculated data. A new stable structure for the Silicon 10 cluster is found. Second, the strong cluster size dependency in the reactivity with ammonia and methanol for Si30(+)Si45(+) is modeled in terms of stacked, six-membered ring structures. This accounts for the periodicity of six in the reactivity pattern. Finally the photofragmentation of Si60(+) indicating mainly Si10(+) daughters is considered. It is suggested that Si60 consists of stacked ten-atom naphthalene-like rings.

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Document Details

Document Type
Technical Report
Publication Date
Sep 01, 1991
Accession Number
ADA240276

Entities

People

  • Daniel A. Jelski
  • Tapio T. Rantala
  • Thomas F. George

Organizations

  • Washington State University

Tags

Communities of Interest

  • Air Platforms
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Band Gaps
  • Band Structures
  • Chemical Reactions
  • Chemical Synthesis
  • Chemistry
  • Classification
  • Electron Energy
  • Electrons
  • Energy
  • Energy Bands
  • First Principles Calculations
  • Geometry
  • New York
  • Reactivities
  • Security
  • United States
  • Universities

Fields of Study

  • Physics

Readers

  • Computational Modeling and Simulation
  • Quantum Chemistry

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene