Total Dielectric Isolation (TDI) of Fully Depleted Device Structures.

Abstract

The aim of this programme is to prepare, evaluate and optimise Total Dielectric Isolated (TDI) structures in order to develop the technology for the preparation of substrates for circuits which exhibit improved radiation tolerance. The work carried out during the life of this project has provided a sound base for this novel technology. Successful experiments include the preparation of device worthy substrates in variously patterned wafers, identification of the microstructure of TDI wafers by cross-sectional transmission electron microscopy (XTEM) and the successful implementation of a new predictive software package (IRIS). This SIMOX process model has been used to optimise the masking layer thicknesses and processing parameters to achieve planar TDI structures. (Author)

Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1991
Accession Number
ADA241926

Entities

People

  • Peter L. Hemment

Organizations

  • University of Surrey

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Cell Physiological Processes
  • Corpuscular Radiation
  • Electron Microscopy
  • Electrons
  • Elementary Fermions
  • Elementary Particles
  • Fermions
  • Identification
  • Ionizing Radiation
  • Microscopy
  • Microstructure
  • Nuclear Radiation
  • Optical Analysis
  • Radiation
  • Substrates
  • Transmission Electron Microscopy

Readers

  • Robotics and Automation.
  • Semiconductor Device Technology
  • Systems Analysis and Design

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene