The Effects of Pulse Plating on Low Contraction Chromium Electrodeposits

Abstract

The pulse plating of low concentration (LC) chromium using low pulse frequencies (less than 50 Hz) and high pulse frequencies (greater than 90 Hz) was evaluated and compared to direct current (dc)-plated LC chromium with respect to microstructure and mechanical properties. Low frequency pulse plating significantly increases the hardness and cathode current efficiency (CCE) over dc-plated LC electrodeposits but does not reduce deposit stress. Hardness values in excess of 1175 KHN (50 g load) can be obtained with pulsing frequencies less than 26 Hz and duty cycles (percent on-time) less than 21 percent. CCE in excess of 22 percent can be obtained when pulsing frequencies are less than 12 Hz and duty cycles are less than 33 percent. This corresponds to a 54 percent increase in hardness and a 100 percent increase in CCE compared to dc-plated LC chromium.

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Document Details

Document Type
Technical Report
Publication Date
Sep 01, 1991
Accession Number
ADA242298

Entities

People

  • Mark Miller
  • S. K. Pan

Organizations

  • United States Army Armament Research, Development and Engineering Center

Tags

Communities of Interest

  • Space
  • Weapons Technologies

DTIC Thesaurus Topics

  • Coatings
  • Deposition (Materials Processing)
  • Direct Current
  • Electrodeposition
  • Electroplating
  • Engineering
  • Frequency
  • Hardness
  • Materials
  • Mechanical Properties
  • Mechanics
  • Metals
  • Microstructure
  • Military Research
  • Schematic Diagrams
  • Security
  • Tensile Strength

Readers

  • Electrical Engineering
  • Surface Engineering/Surface Coating Technology.