X-Ray Lithography In Japan
Abstract
Integrated circuits (semiconductors) are the key components of modern computers, communication systems, consumer electronics, and the new generations of smart machines and instruments. Japan's strong position and growing influence in the manufacture of semiconductors and systems based on them is well known and well documented. Microlithography is one the most critical elements of the semiconductor manufacturing process because it determines the minimum feature size and the functional capabilities of the semiconductor. Because it is used many times in the manufacturing sequence, the quality of the microlithography process (i.e., number of defects, control for feature size, etc.) is critical in determining the yield and cost of semiconductors and hence the competitiveness of the electronics industry. At present all volume semiconductor manufacturing is done with optical UV (ultraviolet) projection lithography, twenty-year-old photographic technology which has been and is still evolving. There are many issues that limit the technical capability and cost-effectiveness of UV lithography, and thus, alternate lithographic techniques are continuously being researched and developed. X-ray lithography, which was invented in the early 1970s, holds the promise of providing higher yields in manufacturing semiconductors by virtue of enhanced process latitude, process robustness, and resolution. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 01, 1991
- Accession Number
- ADA243660
Entities
People
- Franco Cerrina
- Gene E. Fuller
- James T. Clemens
- R. F. Pease
- Robert W. Hill