Electrical Energy Shaping for Ballistic Applications in Electrothermal Guns
Abstract
A five-stage, 130-kJ pulse forming network (PFN) for delivering electrical energy to an experimental ETC (Electrothermal chemical) gun is described. The device is fundamentally a network of RLC circuits where the load, R, is either a fixed-metallic or variable-plasma resistance. Capacitors provide long-term energy storage, inductors are used for pulse shaping, ignitrons are used as closing switches, and power diodes serve as 'clamping' diodes to protect the capacitors from voltage reversal during operation. Linear theory network simulations of circuits discharge into the fixed load within an energy range of 1.4 to 22.0 kJ are in close agreement with experiment. Resistance measurements of plasmas generated using this PFN indicate that plasma resistance is a strong function of current. It is linear with capillary length and inversely proportional to capillary diameter. Loss of diodes during operation was frequent. The probable cause of this problem and circuit revisions to reduce diode stresses are described.
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 01, 1991
- Accession Number
- ADA243850
Entities
People
- A. Zielinski
- G. L. Katulka
- H. Burden
- K. White
Organizations
- Ballistic Research Laboratory