Process Issues in the Development of a Ferroelectric Capacitor/CMOS Test Chip
Abstract
Processing details are discussed in the development of a procedure to fabricate lead-zirconate-titanate (PZT) ferroelectric capacitors on a CMOS test chip for purposes of electrical and radiation characterization studies. During the course of this work, several problems were encountered in the deposition and photoengraving of the platinum electrodes that form the conducting plates of the capacitor. Both dry and wet etching techniques were employed in an effort to define the top platinum electrodes. Solutions are discussed for those problems solved during this initial development phase.
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 01, 1991
- Accession Number
- ADA245179
Entities
People
- Bernard J. Rod
Organizations
- Harry Diamond Laboratories