Bimonthly Report Detailing Work Done on Contract N00014-89-C-2238 during December 1991-January 1992
Abstract
We are assembling a completed advanced ion column for the 0.25 micron mask repair system including the appropriate harnesses and power supplies. We are evaluating the system layout to determine any mechanical modifications necessary to mount the column on the 0.25 micron system without interference. Specifically minor mechanical changes are being made to the variable aperture mechanism, the spacer between the column and chamber lid, and the bracket supporting the ion pump which differentially pumps the column. Using a Hampshire X-ray mask we evaluated the edgelock analysis and repaired defects using the analysis after the initial calibration. The edgelock(or edgefinding) experiments were essentially the same as those done on IBM masks. The goal was to show that the edge analysis could be successfully adapted to a different edge, reflective or either differences in absorber material or different vendor's masks. Preliminary statistics show an accuracy about that obtained from the evaluation of the IBM mask, ie. a standard deviation of 0.02 micron on a daily basis. Further the data was also analyzed using the CD(critical dimension) software package accompanying the FESEM acquired last year.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1992
- Accession Number
- ADA246448