X-Ray Photoelectron Spectroscopy Study on the Double Layer at an Al203-Al Interface

Abstract

Upon oxidation of a clean Al Aluminum surface, and electrical double layer (EDL) is formed at the aluminum-aluminum oxide interface. This EDL is investigated using X-ray Photoelectron Spectroscopy data available in the literature. The EDL strength, measured as a potential difference across the EDL, depends on the Al surface and the oxidation process. The polarity of the EDL is however invariably the same: the Al2o3 side of the Al-Al203 interface is always positively charged. The reduction of the Al work function upon oxidation is attributed to this EDL. The asymmetry in the potential barrier shape formed in Al-Al2o3-Al sandwiches is also attributed to a strong EDL at the electron-film interface and a weaker EDL at the interface between the counter electrode and the film. (Author)

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1992
Accession Number
ADA246454

Entities

People

  • David E. Ramaker
  • Hideo Sambe

Organizations

  • George Washington University

Tags

Communities of Interest

  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Aluminum
  • Aluminum Oxides
  • Electrons
  • Oxidation
  • Oxides
  • Photoelectrochemical Cells
  • Photoelectrons
  • Plastic Explosives
  • Spectroscopy
  • Work Functions
  • X Ray Photoelectron Spectroscopy
  • X Rays

Readers

  • Nanofabrication and Microfabrication.
  • Powder metallurgy of Titanium alloys.
  • Semiconductor Device Technology

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene