RF Vacuum Microelectronics
Abstract
Improvement in the tip fabrication process and the investigation of burn-in and test procedures have been the focus for the first three months of the contract. The process development and improvement was an extension of internally funded work for flat panel displays. The mask set used was from this work. Since the basic tip process is not the limit to high frequency operation, using this mask set let us start work immediately. A variety of problems have been overcome or alleviated. These include gate/cathode leakage, tip height relative to the gate metal, yield, and cracking at metalization crossovers.
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 31, 1991
- Accession Number
- ADA246579
Entities
People
- Alan Palevsky
Organizations
- RTX