Investigation of Low-Temperature, Multilevel Dielectrics for Application for Radiation Tolerant, Submicron-Scaled IC Technology

Abstract

The following report details the progress on ONR contract number N-00014-86-C-0421 during the period from January 1, 1991 to December 31, 1991. This program entails a joint effort between Research Triangle Institute and North Carolina State University. Funding is being provided by the Innovative Science and Technology Office of the Strategic Defense Initiative. The objective of this program is to develop deposited, multilayer dielectric structures for integrated circuit applications requiring reliable radiation tolerant insulators.

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Document Details

Document Type
Technical Report
Publication Date
Feb 04, 1992
Accession Number
ADA246989

Entities

People

  • G. G. Fountain
  • G. Lucovsky
  • Robert J. Markunas

Organizations

  • RTI International

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Dielectric Films
  • Dielectrics
  • Electrical Properties
  • Films
  • Integrated Circuits
  • Low Temperature
  • Materials Processing
  • North Carolina
  • Oxide Films
  • Oxides
  • Physical Properties
  • Power Levels
  • Radiation
  • Refractive Index
  • Strategic Defense Initiative
  • Teamwork
  • Triangles

Fields of Study

  • Physics

Readers

  • Academic Conference Management
  • Integrated Circuit Design and Technology.
  • Semiconductor Device Technology

Technology Areas

  • Microelectronics