Growth and Surface Chemistry of Passivating Insulators for Silicon Technology

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Document Details

Document Type
Technical Report
Publication Date
Feb 10, 1992
Accession Number
ADA247243

Entities

People

  • G. W. Rubloff
  • Maximilian Liehr

Organizations

  • IBM Thomas J. Watson Research Center

Tags

DTIC Thesaurus Topics

  • Abstracts
  • Chemical Vapor Deposition
  • Chemistry
  • Contracts
  • Dielectrics
  • Electrical Properties
  • Electron Energy
  • Electrons
  • Epitaxial Growth
  • High Resolution
  • High Temperature
  • Low Temperature
  • Materials
  • Materials Processing
  • Materials Science
  • Surface Chemistry
  • Vapor Deposition

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene