Computer-Controlled Ion Beam Sputter-Deposition of Superconducting Oxide Films
Abstract
The system developed can be used to produce multicomponent and/or multilayered structures. Computer-controlled growth of multicomponent materials can be accomplished by sequentially sputtering from elemental targets. Layered structures can be obtained by sequentially sputtering from different multicomponent targets. Sputtering targets are mounted on a motor-driven rotating holder for sequential, in situ positioning in front of the ion beam. The thickness of each individual material layer is monitored by a quartz crystal resonator. The computer program uses feedback control from the quartz crystal monitor to turn the ion beam on and off, and to position the appropriate target in front of the ion beam. This system can be utilized in three basic configurations: with multiple elemental (or single cation) targets, for growing multicomponent oxide films (multiple cations) of any chosen composition, e.g. Y, Cu, and BaF targets for YBa2Cu3O7-sigma film growth; with multiple elemental or compound targets, for growing multiple film layers, such as YBa2Cu3O7-sigma / MgO layers.
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 31, 1991
- Accession Number
- ADA248495
Entities
People
- Angus I. Kingon
- Orlando H. Auciello
- Robert F Davis
Organizations
- North Carolina State University