Dissolution Inhibition in Positive Novolak Resists
Abstract
The inhibition of novolak dissolution by various light-sensitive compounds is the basis of the most important imaging materials of the semiconductor device industry. A formidable amount of empirical information on these systems is available in the literature, yet in spite of this the molecular mechanism of the inhibition phenomenon is not understood and progress in this area is made largely by trial and error. The purpose of this part of the project is to develop a mechanistic model of dissolution and dissolution inhibition in the hope that this will serve as the basis of a more rational optimization of resist materials.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 01, 1992
- Accession Number
- ADA251347
Entities
People
- Arnost Reiser
- Kenneth J. Wynne