Adsorption, Diffusion and Epitaxy of Si on Si(100)

Abstract

We review our recent work on the migration and the self-organization of the Si atoms deposited on a Si(100)-(2Xl) surface. The silicon silicon interactions are modelled by the Stillinger-Weber potential, and we use molecular dynamics and Monte Carlo simulations, total energy calculations, as well as phenomenological approaches to study the following topics of current interest: the effects of surface reconstruction-unreconstruction on the adsorption dynamics; the spatial distribution of the adsorbate in the early stages of deposition; the migration of an adatom on a terrace or across a step; the role of adatom-adatom interactions in the formation of anisotropic islands; the transformation of a surface with single layer steps to one with double layer steps; the effects of kink-kink interaction in step roughening, etc. Wherever possible, the results obtained are compared with findings of recent experiments; we find that our qualitative conclusions are in agreement with the STM observations.

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Document Details

Document Type
Technical Report
Publication Date
May 15, 1992
Accession Number
ADA252058

Entities

People

  • H. Metiu
  • Zhicai Zhang

Organizations

  • University of California, Santa Barbara

Tags

Communities of Interest

  • Energy and Power Technologies
  • Weapons Technologies

DTIC Thesaurus Topics

  • Adsorbates
  • Adsorption
  • Agreements
  • Arrhenius Equation
  • Chemistry
  • Diffusion Coefficient
  • Dynamics
  • Epitaxial Growth
  • Equations
  • Heat Of Activation
  • Migration
  • Molecular Dynamics
  • Monte Carlo Method
  • Observation
  • Simulations
  • Spatial Distribution
  • Two Dimensional

Fields of Study

  • Physics

Readers

  • Computational Fluid Dynamics (CFD)
  • Thin Film Deposition Science.