OSA Proceedings of the Topical Meeting on Soft-X-Ray Projection Lithography Held in Monterey, California on 10-12 April 1991. Volume 12
Abstract
The OSA Topical Meeting on Soft-X-Ray Projection Lithography was organized to bring together researchers working on these diverse issues. The meeting was held April 10-12, 1991, at the Monterey Conference Center in Monterey, California. As these proceedings show, significant progress is being made in all of the research fronts, but much remains to be done in order to overcome the difficult, yet exciting, challenges that lie ahead. A new approach to lithography targeted for the 256-Mb generation and beyond is now being explored. The idea is to attempt to realize an all-reflective, demagnifying, projection optical system suitable for soft-x-ray wavelengths in the 5-50-nm wavelength range. A patterened reflecting mask on a thick, robust, thermally stable substrate is under consideration as a way around the difficulties of the membrane mask. This approach was inspired by the recent advances in the technology of producing and manipulating x rays in this wavelength region.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 22, 1992
- Accession Number
- ADA252998
Entities
People
- Jarus W. Quinn
- Jeffrey Bokor
Organizations
- Optica