Novel Optoelectronic Devices Based on Combining GaAs and InP on Si
Abstract
We have concentrated on the application of the shadow masked growth technique to the fabrication of optoelectronic devices. We have shown the fabrication of GaAs/AlGaAs and InP/InGaAsP (strained) QW multi-wavelength laser arrays and the use of SMG for the integration of a passive and active waveguiding section in GaAs based materials. On the n-doped substrate (with the shadow mask( we have deposited a 500nm n-doped lower InP cladding layer and an undoped active region consisting of 4 InGaAs strained quantum wells with InGaAsP barriers and separate confinement layers.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1992
- Accession Number
- ADA253781
Entities
People
- Piet Demeester