Advanced Processing and Characterization Technologies. Fabrication and Characterization of Semiconductor Optoelectronic Devices and Integrated Circuits Held in Clearwater, Florida on 8-10 May 1991. American Vacuum Society Series 10
Abstract
The Topics include: Focused-Ion-Beam Micromachining: A Fabrication Tool for Prototypal Semiconductor Lasers; A Novel Vacuum Lithography with SiN(x) Resist by Focused Ion Beam Exposure and Dry Etching Development; ECR Plasma Etching of III-V Optoelectronic Devices; Influence of SiCl4 Reactive Ion Etching on the Electrical Characteristics of GaAs; Electron-beam Writing System for Holographic Optical Elements; Micro Dry Etching Process for Vertical Cavity Surface Emitting Lasers; Sulfide Treatment on III-V Compound Surfaces; Sulfur Passivation of GaAs Surfaces; Direct Observation of GaAs Surface Cleaning Process Under Hydrogen Radical Beam Irradiation; Near Surface Type Conversion of p-type, Single Crystal InP by Plasma Exposure; Advances in Controlling Electrical Contacts for Optoelectronics; Indium Ohmic Contacts to n-ZnSe; A New Method of Zn Diffusion into InP for Optical Device Fabrication; Open Tube Double Diffusion for the Fabrication of Bipolar Transistor Waveguide Optical Switch; and Full-Water Technology for Laser Fabrication and Testing.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 01, 1992
- Accession Number
- ADA254162
Entities
People
- Paul H. Holloway
Organizations
- University of Florida