An Investigation of Residual Stresses in Machined Silicon Nitride
Abstract
An X-ray diffraction (XRD) residual stress investigation was conducted on groups of machined silicon nitride specimens utilizing copper K alpha radiation, the (323) 0-phase crystallographic planes and the sin2 psi stress-measuring technique. Cylindrical button-head tensile specimens formed by different processes and finish machined by different shops were characterized both before and after heat treatment. Surface machining stresses were also determined on a partial-machined tensile rod and on fractured flexure bars. The residual stress results are presented in the form of a comparative evaluation of processing parameters. Supplemental integrated intensity data from measurements on the partial-machined tensile rod and crushed buttonhead powder samples has demonstrated that XRD residual stress analysis may be applicable as a quality assurance procedure.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 01, 1992
- Accession Number
- ADA254635
Entities
People
- Daniel J. Snoha
- Michael R. Foley