Spectroscopy and Reactions of Hydrazoic Acid on Silicon Single Crystal Surfaces (III). HN3 and DN3 on SI(111)-7x7
Abstract
We have studied the thermal stability and spectroscopy of HN3 on Si(111)-7x7 in the temperature range from 120 to 1350 K. The results are similar to those observed on other two low-index Si surfaces. HN3 was found to molecularly adsorb on Si(111)-7x7 at 120 K, with the formation of dimers at higher dosages (less then or equal to 2.0 L). At 270 K, HN3 began to decompose into HN and N2 species as indicated by the changes in the NH vibration mode in HREELS and the chemical shift of N 1s XPS peak. Between 300 and 800 K, the NH species further decomposed into H and N on the surface, while N2 desorbed molecularly. In this temperature range, the steady increase of the SiNx and Si-H peaks were noted and LEED exhibited a weak (1x1) pattern.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1992
- Accession Number
- ADA255241
Entities
People
- Jason C. Chu
- Lin Ming-chang
- Yuheng Bu
Organizations
- Emory University