A Simple Controller for Repetitive Cycles in Atomic Layer Epitaxy

Abstract

A simple controller system has been designed and added to an existing deposition system in order to implement deposition of silicon by Atomic Layer Epitaxy (ALE). A Remote Plasma-enhanced Chemical Vapor Deposition (RPCVD) system has been modified for automatic control of repetitive cycles of disilane dosing and hydrogen desorption via low energy ion bombardment. The simple configuration of the input/output modules and ease of programming allowed efficient debugging of the installation and a large degree of flexibility in in situ cleaning and in both ALE and CVD experiments.

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Document Details

Document Type
Technical Report
Publication Date
Jun 03, 1992
Accession Number
ADA255497

Entities

People

  • A. Mahajan
  • A> Tasch
  • D. Kinosky
  • R. Qian
  • S. Thomas
  • Srutarshi Banerjee

Organizations

  • University of Texas at Austin

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Abstracts
  • Atomic Layer Epitaxy
  • Automatic
  • Chemical Vapor Deposition
  • Computer Programming
  • Computers
  • Debugging
  • Desorption
  • Energy
  • Epitaxial Growth
  • Flow
  • Hydrogen
  • Ion Bombardment
  • Power Supplies
  • Resilience
  • Universities
  • Vapor Deposition

Readers

  • Nanofabrication and Microfabrication.
  • Semiconductor Device Technology
  • Software Engineering