Pulsed Laser Deposition of Amorphous Diamond-Like Carbon Films with ArF (193 nm) Excimer Laser

Abstract

We have deposited hydrogen-free diamond-like amorphous carbon (amorphous diamond) films by ArF (193 nm) pulsed laser ablation of graphite. The deposition process is performed with the laser power density of only 5x10(8) W/cm2 at room temperature without any auxiliary energy source incorporation. The resulting films possess remarkable physical, optical and mechanical properties which are close to those of diamond and distinct from the graphite target used. The films have a mechanical hardness up to 38 GPa, an optical energy band gap of 2.6 eV and excellent thermal stability. Analysis of electron energy loss spectroscopy reveals the domination of diamond-type tetrahedral bonding structure in the films with the Sp3 bond fraction over 95%. Compared to other reported results of pulsed laser deposited diamond-like carbon films, our experimental results confirm that the laser wavelength or photon energy plays a crucial role in controlling the properties of the pulsed laser deposited diamond-like carbon films.

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Document Details

Document Type
Technical Report
Publication Date
Nov 01, 1992
Accession Number
ADA257551

Entities

People

  • F. Xiong
  • R. P. Chang
  • V. Leppert
  • Y Y Wang

Organizations

  • Northwestern University

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Band Gaps
  • Chemical Vapor Deposition
  • Electron Energy
  • Electrons
  • Energy
  • Energy Bands
  • Excimer Lasers
  • Hardness
  • Laser Beams
  • Lasers
  • Materials
  • Materials Science
  • Mechanical Properties
  • Optical Properties
  • Pulsed Lasers
  • Spectroscopy
  • Thermal Stability

Fields of Study

  • Materials science
  • Physics

Readers

  • Optical Physics and Photonics.
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene