A Comparison Study of Diamond Films Grown on Tungsten Carbide Cobalt Tool Inserts with CH(4) and CF(4) Gas Sources

Abstract

The results of a comparison study of continuous diamond coatings deposited on tungsten carbide-6% cobalt tool inserts using CF4, and CH4, gas sources are presented. The CH4, grown diamond film utilizes a thin (1200 A) amorphous silicon interlayer for adhesion while the CF4, diamond film is deposited directly onto the tool insert. Diamond films produced with CF4, gas have much higher growth rates and better adhesion than diamond films grown with CH4, gas. The films are characterized by scanning and transmission electron microscopy, and Raman spectroscopy to determine film crystallinity and quality. Macroscopic indentation tests have been conducted to determine the adhesion of the films to the substrate, and an aluminum-17 % Si alloy is machined with the diamond-coated tool inserts to determine their performance in a machining environment. A mechanism for the growth of diamond on tungsten carbide-cobalt using CF4, gas is postulated.

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Document Details

Document Type
Technical Report
Publication Date
Nov 01, 1992
Accession Number
ADA257552

Entities

People

  • F. Xiong
  • K. J. Grannen
  • R. P. Chang

Organizations

  • Northwestern University

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies
  • Weapons Technologies

DTIC Thesaurus Topics

  • Adhesion
  • Carbides
  • Ceramic Materials
  • Chemical Vapor Deposition
  • Chemistry
  • Crystal Structure
  • Crystals
  • Cutting Tools
  • Diamond Films
  • Diffraction
  • Materials
  • Materials Science
  • Raman Spectroscopy
  • Silicon Carbide
  • Spectra
  • Spectroscopy
  • Tungsten

Fields of Study

  • Materials science

Readers

  • Battery Technology and Engineering
  • Surface Engineering/Surface Coating Technology.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene