Surface Pi Bonding and the Near-First-Order Desorption Kinetics of Hydrogen from Ge(100)2x1.

Abstract

We show by temperature-programmed desorption that hydrogen desorbs from Ge(100)2xl near 570 K with near-first-order kinetics, similar to the behavior of hydrogen on Si(100)2xl. The near-first-order desorption Kinetics are attributed to pairing on surface dimers induced by the n bond on unoccupied dimer atoms, and a pairing enthalpy of 5 + or - 1 kcal/mol is inferred. However, a comparison between the pairing enthalpies for H atoms on Ge(100) and Si(100) with the electronic structure of the respective clean surfaces indicates that estimates of the pi bond strength based on the surface band structure do not correlate with the propensity for pairing.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Dec 11, 1992
Accession Number
ADA258534

Entities

People

  • Eric Rouchouze
  • Mark P. D'evelyn
  • Stephen M. Cohen
  • Yuemei L. Yang

Organizations

  • Rice University

Tags

Communities of Interest

  • Advanced Electronics
  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Abstracts
  • Adsorption
  • Atoms
  • Band Gaps
  • Band Structures
  • Chemical Vapor Deposition
  • Chemistry
  • Desorption
  • Dynamics
  • Energy
  • Energy Bands
  • Heat Of Activation
  • Hydrogen
  • Kinetics
  • Measurement
  • Military Research
  • Physics

Fields of Study

  • Physics

Readers

  • Electrochemical Engineering/ Fuel Cell Technologies
  • Quantum Chemistry

Technology Areas

  • AI & ML
  • Microelectronics
  • Microelectronics - Graphene