Advanced UHV Thin-Film Deposition Facility for Research in Superconductivity and Superconducting Electronics
Abstract
The final report for the above grant describes an 'Advanced UHV Thin- Film Deposition Facility for Research in Superconductivity and Superconducting Electronics.' A list of acquired equipment and a discussion of special circumstances regarding changes from the proposal and use of the equipment also follows. The completed facility is in full use for research as described in the proposal, and in high Tc superconducting materials research, other oxide materials, and C60 Fullerene alloys. A new vapor synthesis process monitor and control techniques (Atomic Absorption Rate Control) has been developed.
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 28, 1992
- Accession Number
- ADA259089
Entities
People
- Malcolm Beasley
- R. H. Hammond
Organizations
- Stanford University