Damping Capacity of Artificially Multilayered Thin Films

Abstract

The results of the research conducted during the first year of this program (12/90 - 8/91) are summarized below: (a) An electrodeposition system has been assembled which is capable of producing high quality multilayered thin films. (b) Cu-Ni multilayered films with bilayer repeat lengths of 2.5 and 22 nm have been produced. (c) These films have displayed unusually large damping capacity over the frequency range 0.1 to 10 Hz, compared to typical metallic behavior.

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Document Details

Document Type
Technical Report
Publication Date
Aug 01, 1991
Accession Number
ADA259701

Entities

People

  • Robert C. Cammarata

Organizations

  • Johns Hopkins University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Diffraction
  • Electrodeposition
  • Electron Microscopy
  • Engineering
  • Films
  • Grain Growth
  • Grain Size
  • High Temperature
  • Low Temperature
  • Materials
  • Materials Engineering
  • Materials Science
  • Measurement
  • Thin Films
  • Transmission Electron Microscopy
  • X Rays
  • X-Ray Diffraction

Fields of Study

  • Physics

Readers

  • Mathematics or Statistics
  • Thin Film Deposition Science.