Ion Beam Mixing in Multi-Quantum Well Structures

Abstract

The aims of the project were to investigate impurity induced disordering, using ion implantation, for the fabrication of optical waveguides in Aluminum Gallium Arsenide/Gallium Arsenide quantum well structures. Research prior to the initiation of the contract had indicated that the extent of the disordering, as measured by photoluminescence, was determined by both the nature, energy and dose of the implanted ion, and the temperature and time of the annealing process. While encouraging results were obtained for the loss characteristics of disorder delineated stripe optical waveguides, it was clear that not enough was known about the properties of the disordered QW structures to enable low loss disorder delineated strip optical waveguides to be designed and fabricated in AlGaAs/GaAs MQW structures. In addition the impurity chosen to disorder the QW was also of importance and a detailed evaluation of the appropriate ion suggested that some of the less common impurities would probably be more suitable for photonic devices.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Sep 20, 1992
Accession Number
ADA259772

Entities

People

  • Bernard L. Weiss

Organizations

  • University of Surrey

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Absorption Coefficients
  • Compound Semiconductors
  • Contracts
  • Electric Fields
  • Electrical Engineering
  • Ion Implantation
  • Materials
  • Materials Science
  • Optical Absorption
  • Optical Properties
  • Optical Waveguides
  • Photonic Devices
  • Quantum Electronics
  • Quantum Wells
  • Refractive Index
  • Semiconductor Physics
  • Semiconductors

Fields of Study

  • Materials science

Readers

  • Molecular and Cellular Biology
  • Optical Physics and Photonics.
  • Semiconductor Device Technology

Technology Areas

  • Microelectronics
  • Quantum Computing