Selective Processing Techniques for Electronics and Opto-Electronic Applications: Quantum-Well Devices and Integrated Optic Circuits
Abstract
During this period, significant headway has been made on the key contract objectives. Several novel integrated optical devices have been demonstrated, and simulation of new devices is guiding further experiments. Our low-damage cryogenic etching technique has-been demonstrated to be suitable for sub-micron patterning, and applied to device fabrication. Finally, light-induced wet-etching techniques have been used in several new and important areas of application.
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 10, 1993
- Accession Number
- ADA262887
Entities
People
- Richard M. Osgood, Jr.
Organizations
- Columbia University