Radiation-Induced Modifications of Allylamino-Substituted Polyphosphazenes
Abstract
A collaborative effort to synthesize amino-substituted polyphosphazenes and examine their sensitivity to radiation has recently been undertaken. The objective was to determine the value of using such polymers as new and better resist materials for microlithographic applications. An initial study was carried out using elastomeric phenoxy-substituted polyphosphazenes as models for radiation and grafting. However, it became necessary to synthesize several new amino-substituted polyphosphazenes for several reasons. First, the usefulness of elastomeric polymers for resist applications is severely limited by their inability to remain dimensionally stable at normal temperatures. Glassy polymers have been shown to provide the necessary thermal properties required for resist films deposited on SiO2 wafers. Second, the amino-substituted polyphosphazenes are excellent film-forming polymers with high molecular weights. Finally, it seemed possible that these polymers would exhibit similar reactive ion etching resistance to those of a phenoxy-substituted counterpart, and experimental work was performed to determine reactive ion etching values for the most radiation-sensitive of the new polymer candidates.... Polymers, Synthesis, Crosslinking, Photolithography, Phosphazenes, Radiation.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 18, 1993
- Accession Number
- ADA264914
Entities
People
- G. L. Grune
- Harry R. Allcock
- M. F. Welker
- R. T. Chern
- V. T. Stannett
Organizations
- Pennsylvania State University