Applications of Spectroscopic Ellipsometry to Microelectronics

Abstract

Ellipsometry has been applied to problems in the microelectronics industry from the beginning in the 1960's. More recently spectroscopic ellipsometry has been introduced. In-situ during process ellipsometry offers great promise for monitoring and control of a wide variety of microelectronics processes. This review covers some applications in silicon technology such as oxidation, chemical vapor deposition, etching, interfaces, and new processing techniques such as plasma, ion beam and rapid thermal, in an effort to demonstrate the kinds of crucial microelectronics information and processes that modern ellipsometry can access. The conclusion is that single wavelength ellipsometry along is not sufficient; spectroscopic ellipsometry is required to establish the optimum ellipsometry measurement conditions. The future of ellipsometry in microelectronics is assessed.

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Document Details

Document Type
Technical Report
Publication Date
May 04, 1993
Accession Number
ADA265148

Entities

People

  • Eugene A. Irene

Organizations

  • University of North Carolina at Chapel Hill

Tags

DTIC Thesaurus Topics

  • Accuracy
  • Chemical Vapor Deposition
  • Chemistry
  • Films
  • Ion Beams
  • Ions
  • Materials
  • Materials Processing
  • Materials Science
  • Measurement
  • Microelectronics
  • Monitoring
  • Optical Properties
  • Oxidation
  • Refractive Index
  • Thin Films
  • Vapor Deposition

Readers

  • Nanofabrication and Microfabrication.
  • Systems Analysis and Design

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene