Ellipsometry Studies of Semiconductors Surface Cleaning

Abstract

Ellipsometry is shown to provide a sensitive evaluation of the surface cleaning process based on in-situ and ex-situ studies of the cleaning of Si, Ge, and InP surfaces. Both single wavelengths and spectroscopic ellipsometry are shown to be applicable. The essential of the measurement and sample results are discussed. Ellipsometry, Surface cleaning

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Document Details

Document Type
Technical Report
Publication Date
May 04, 1993
Accession Number
ADA265150

Entities

People

  • Eugene A. Irene
  • Y. Z. Hu

Organizations

  • University of North Carolina at Chapel Hill

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Chemical Cleaning
  • Chemistry
  • Databases
  • Dry Cleaning
  • Figure Of Merit
  • Films
  • Measurement
  • Military Research
  • North Carolina
  • Optical Absorption
  • Oxides
  • Semiconductors
  • Spectra
  • Substrates
  • Surface Properties
  • Thickness
  • United States

Readers

  • Semiconductor Device Technology

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene