High Temperature Reliability of Refractory Metal Ohmic Contacts to Diamond

Abstract

Several metallization schemes using refractory metals have been demonstrated to produce ohmic contacts to diamond via a solid-state reaction process. This process utilizes existing microelectronic techniques and provides strongly adherent contacts which exhibit low contact resistance. Measurements of the long-term reliability of Mo/Au contacts formed by this process on a type IIb diamond crystal are presented here for the temperature range 450 to 625 deg C. The measurements consist of the resistance between two contacts as a function of isothermal annealing time over time intervals in excess of 130 h in a purified inert ambient. The Mo/Au contacts appeared to be stable and reliable at these high temperatures with no indications of deterioration or degradation of performance.

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Document Details

Document Type
Technical Report
Publication Date
Jul 01, 1992
Accession Number
ADA266667

Entities

People

  • C. A. Hewett
  • M. Roser

Organizations

  • Naval Command, Control and Ocean Surveillance Center

Tags

Communities of Interest

  • Advanced Electronics
  • Biomedical
  • Sensors

DTIC Thesaurus Topics

  • Chemical Reactions
  • Chemistry
  • Films
  • Flow
  • High Temperature
  • Hydrogen
  • Hydrogenation
  • Materials
  • Materials Science
  • Measurement
  • Phase Transformations
  • Radiation
  • Refractory Metals
  • Semiconductors
  • Stainless Steel
  • Thermal Conductivity
  • Time Intervals

Readers

  • Semiconductor Device Technology
  • Surface Engineering/Surface Coating Technology.

Technology Areas

  • Microelectronics