Annual Grant Progress Report (FDP) for Contract N00014-92-J-1757 (University of California)
Abstract
This aims of this research grant has not been modified. The aims are to extend the reliability models for oxide wear out and hot-electron-induced degradation from DC stress to AC stress by arbitrary waveforms as encountered in circuits, to develop a circuit reliability simulator that incorporates the best known reliability models for oxide and hot electrons effects and to develop improved device and reliable oxides. We have set a new world record in silicon transistor --13.5ps at room temperature and at 1.5 volt. This resulted from our research into the design and fabrication of advanced silicon-on-insulator MOS transistors. The goal is to understand the reliability limits of transistor scaling.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 01, 1993
- Accession Number
- ADA266948
Entities
People
- Chenming Hu
Organizations
- University of California, Berkeley