Materials Processing and Manufacturing Technologies for Diamond Substrates Multichip Modules
Abstract
We have been able to run diamond chemistry plasmas for only short periods of time, due to the instability of the power supply at higher powers. Under these conditions, we have seen the spectral signature of high growth rate deposition, but were unable to sufficiently heat the substrate nor to hold the discharge stable enough to observe growth. With increased isolation and stable high power operation, we expect to achieve first diamond growth in the near future. An experimental plan to transfer the high growth rate process on 6 diameter substrates will initiate after first growth, and will proceed in parallel with other reactor upgrades. We are continuing to investigate potential improvements in plasma shape. We have already found a significant flattening of the plasma, indicative of higher growth and uniformity, by minor modifications to the chamber cavity scaled from the prototype experiments. As the modelling passes experimental benchmaking, other more significant changes may be incorporated. Other chamber design issues that will be investigated early in these experiments include uniformity of gas delivery, diagnostic window location and orientation, and sufficiency of cooling to the chamber walls.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 29, 1993
- Accession Number
- ADA268989
Entities
People
- Evelio Sevillano