Reactions of CnFm+ Ions with C2F4 and Other Perfluorocarbons

Abstract

A variety of processes, including polymerization and production of gaseous species, occur in discharges containing C2F4. Glow discharge polymerization of C2F4 has been used commercially to prepare and deposit thin dielectric films for capacitors. The C2F4 glow discharge produces films which can have electrical properties superior to those of conventionally prepared poly-(tetrafluoroethylene) (PTFE) yet have IR spectra resembling spectra of conventional PTFE. C2F4 is sometimes added to discharges of other halocarbons used in plasma etching in order to control the etching. Addition of C2F4 to a CF4 plasma has the effect of reducing the fluorine-to-carbon ratio, which affects the Si-to-SiO2 etch rate ratio. When large amounts of C2F4 is produced and acts as a recombinant in discharges of other halocarbon gases.

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Document Details

Document Type
Technical Report
Publication Date
Jun 10, 1993
Accession Number
ADA269084

Entities

People

  • Albert A Viggiano
  • John F. Paulson
  • Robert A. Morris

Organizations

  • Phillips Laboratory

Tags

Communities of Interest

  • C4I
  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Arrhenius Equation
  • Charge Transfer
  • Chemistry
  • Curvature
  • Electrical Properties
  • Electrical Resistance
  • Energy
  • Flow Rate
  • Fluoropolymers
  • Glow Discharges
  • Heat Energy
  • Heat Of Formation
  • Heat Of Reaction
  • Ion Sources
  • Measurement
  • Molecules
  • Physical Chemistry

Readers

  • Canadian European Scientific Immigration and Epilepsy Clearance Studies
  • Plasma Physics.
  • Surface Coatings Technology.