Tunneling Microscopy of Semiconductors

Abstract

This is the final report of research activities on Tunneling Microscopy of Semiconductor Surfaces, accomplished during a 3-year JSEP Graduate Fellowship awarded to Silva K. (Leonard) Thesis for work in the Harvard JSEP laboratory under the guidance of Prof. J. Golovchenko. The work includes: construction of a two-tip tunneling microscope, study of low coverage phases of Pb on Si(lll), study of surface diffusion of Pb on Ge(lll)-c(2x8), and study of Ge growth on Si(lll). Tunneling microscopy, Semiconductor surfaces, Surface diffusion.

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Document Details

Document Type
Technical Report
Publication Date
Aug 31, 1993
Accession Number
ADA270232

Entities

People

  • S. K. Theiss

Organizations

  • Harvard University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Air Force
  • Boundaries
  • Calibration
  • Diffusion
  • Electronics
  • Energy
  • Frequency
  • Heat Of Activation
  • Measurement
  • Microscopes
  • Microscopy
  • Monomolecular Films
  • Quantum Tunneling
  • Semiconductors
  • Solid State Electronics
  • Tunneling

Fields of Study

  • Physics

Readers

  • Technical Research and Report Writing.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene