The Deposition of Electro-Optic Films on Semiconductors
Abstract
High quality potassium niobate thin films have been grown on magnesium oxide, spinel, potassium tantalate, and sapphire by Ion Beam Sputter Deposition. The effects of substrate preparation, process conditions, and film stoichiometry are being correlated with optical properties. The factors contributing to optical losses is the present focus of our research since low losses are an essential criteria for building device structures. Electro-optic properties of KNbO3 films on MgO are found to be similar to bulk, although the scattering losses are very high for these films. In comparison KNbO3 films grown on KTaO3 exhibit low losses of less than 8 dB, while losses for films on spinel showed to be in between those two. The variety of substrates provide us with differences in lattice mismatch, refractive index mismatch, surface morphologies, and microstructure, all of which influence loss characteristics.
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 08, 1993
- Accession Number
- ADA270823
Entities
People
- Angus I. Kingon
- Klaus J. Bachmann
- Orlando H. Auciello
Organizations
- North Carolina State University