Picoindentation Hardness Measurements Using Atomic Force Microscopy

Abstract

An atomic force microscope (AFM), with a specially prepared diamond tip, has been modified to measure indentation hardness with an indentation depth as low as 1 nm. This indentation depth is much smaller than the depth of more than 20 nm that have been reported to date. The AFM indentation technique allows the hardness measurements of surface monolayers and ultrathin films in multilayered structures at very shallow depths and low loads. The picoindentation hardness of single crystal silicon are measured using this technique. A subtraction technique is also described which allows the actual hardness measurements of rough surfaces such as magnetic thin film rigid disks.

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Document Details

Document Type
Technical Report
Publication Date
Oct 10, 1993
Accession Number
ADA270877

Entities

People

  • Bharat Bhushan
  • Vilas N. Koinkar

Organizations

  • Ohio State University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Bulk Materials
  • Cantilever Beams
  • Depth
  • Electron Microscopy
  • Films
  • Gray Scale
  • Hardness
  • Magnetic Films
  • Materials
  • Measurement
  • Microscopes
  • Microscopy
  • Scanning Electron Microscopy
  • Shallow Depth
  • Single Crystals
  • Surface Roughness
  • Thin Films

Fields of Study

  • Materials science
  • Physics

Readers

  • Explosive Engineering.
  • Thin Film Deposition Science.