Optical Switch Evaluation Support

Abstract

Extensive testing has been done on nonlinear interface optical switch (NIOS) devices fabricated from laser deposited nonstoichiometric tungsten oxide films. A Fresnel coefficient formalism for evaluating the indices of refraction of the films has been developed. Three cycles of testing involving changing the tungsten-oxygen stoichiometry have not produced extremely large photorefractive effects. It was decided, after using a mathematical model to determine the required incident and reflection angles, to make the next set of NIOS devices from a film deposited on ZnS prisms. ZnS more closely matches the low light intensity index of the films. Preliminary studies of further changes to produce stronger nonlinearity have been performed. Raman spectroscopy showed that these films heated in oxygen organize themselves into octohedra, which are thought to be necessary for the photorefractive effects observed in titanates and niobates. Heating the films in vacuum produces blue films which ESCA shows contain tungsten in the +4 oxidation state. Such electron rich species might be able to provide highly polarizable charge carriers. In addition to use as optical switches, use of these films to make reconfigurable Dammann gratings has been studied. These gratings would allow optical addressing of large size S-SEED arrays.

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Document Details

Document Type
Technical Report
Publication Date
Jul 01, 1993
Accession Number
ADA270948

Entities

People

  • Joseph Chaiken

Organizations

  • Syracuse University

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Chemical Vapor Deposition
  • Chemistry
  • Computer Programming
  • Computer Programs
  • Computers
  • Laser Beams
  • Materials
  • Materials Processing
  • Materials Science
  • Materials Testing
  • Nonlinear Optics
  • Optical Properties
  • Optics
  • Oxide Films
  • Refraction
  • Refractive Index
  • Spectroscopy

Fields of Study

  • Physics

Readers

  • Integrated Circuit Design and Technology.
  • Optical Physics and Photonics.
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene