Materials Processing and Manufacturing Technologies for Diamond Substrate Multichip Modules
Abstract
This quarter has seen the first production of continuous diamond films in our 75kW reactor. Our efforts have concentrated on three fronts: improving reliability and capability of the reactor, understanding the diamond growth chemistry and how it compares to the prototype operation, and further modeling for refining the reactor design. On the first front, we are regularly operating the reactor around the clock, and steadily improving the power utilized in diamond growth as well as the design and thermal control of the substrate stage. On the second front, we have initiated a series of deposition runs using a matrix of conditions to investigate the effects of gas composition and throughput on growth rate and diamond quality. These runs have included real time pyrometry, emission spectroscopy, and residual gas analysis for comparison with prototype operation and modeling. Our first iteration has yielded what we believe is a world record of over 350 mg/hr of CVD diamond at only 40 kW of microwave power. Our near term goals include: (1) production of free-standing 6 diameter films, (2) finishing the current iteration of chemistry matrix runs and understanding the similarities (and differences) with our 2.45 GHz prototype; (3) further increasing power delivered to the plasma, and power removal capability of the substrate stage.
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 20, 1993
- Accession Number
- ADA271484
Entities
People
- Evelio Sevillano