Laser Diagnostics of RF Hydrogen Plasma Reactors: Application to the Processing of III-V Materials

Abstract

Two photon laser induced fluorescence (TALIF) has been developed as a convenient and reliable diagnostic of H atoms in plasma processing environments. It has high spatial and temporal resolution, good sensitivity, and the capability of absolute concentration measurements. Detailed diagnostics have been carried out in plasma reactors with and without semiconducting wafers. These measurements have led to a model that incorporates H atom production, diffusion, and surface recombination. This model has accurately predicted both the spatial and temporal behavior of the H-atom concentration in a plasma processing environment. Atomic H, Glow discharge, Plasma processing, Laser diagnostics III-V semiconductors

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Document Details

Document Type
Technical Report
Publication Date
Feb 01, 1993
Accession Number
ADA272659

Entities

People

  • Angeliki Tserepi
  • Bryan L. Preppernau
  • Jim Dunlop
  • T. A. Miller

Organizations

  • Ohio State University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Chemical Reactions
  • Chemistry
  • Dissociation
  • Dye Lasers
  • Electronics
  • Electronics Laboratories
  • Emission
  • Field Effect Transistors
  • Glow Discharges
  • Hydrogen
  • Laser Beams
  • Laser Diagnostics
  • Laser Induced Fluorescence
  • Lasers
  • Materials
  • Measurement
  • Semiconductors

Readers

  • Computational Modeling and Simulation
  • Molecular Photonics/Laser Physics
  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.

Technology Areas

  • Directed Energy
  • Microelectronics