X-Ray Diffraction Analysis of Electrodeposited Beta-Tantalum

Abstract

An adherent coating of beta-tantalum (beta-tantalum) has been electrodeposited on copper from a FLINAK molten salt electrolyte. Electrolyte temperatures ranged from 700 to 800 deg C using pulse current electrolysis at current densities higher than 100 mA/sq cm. The beta-tantalum was deposited to a thickness of over 3 mils. The x ray diffraction pattern of the electrodeposited beta-tantalum was indexed using a Hull-Davey chart. The coatings were found to have a highly preferred orientation, and the tetragonal structure was found to have the lattice parameters of a = 6.419 A and c = 3.051 A. Molten salt, Electrodeposition, Beta-Tantalum, Tantalum, X-Ray diffraction

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Document Details

Document Type
Technical Report
Publication Date
Sep 01, 1993
Accession Number
ADA273254

Entities

People

  • John F. Thompson
  • Mark D. Miller

Organizations

  • United States Army Armament Research, Development and Engineering Center

Tags

Communities of Interest

  • Air Platforms
  • C4I

DTIC Thesaurus Topics

  • Abstracts
  • Coatings
  • Crystal Structure
  • Current Density
  • Diffraction
  • Diffraction Analysis
  • Electrodeposition
  • Electrolysis
  • Electrolytes
  • Electron Microscopes
  • Gases
  • Materials
  • Orientation (Direction)
  • Plating
  • Radiation
  • X Rays
  • X-Ray Diffraction

Fields of Study

  • Materials science

Readers

  • Electrochemical Engineering/ Fuel Cell Technologies
  • Operations Research
  • Powder metallurgy of Titanium alloys.